200 mm wafer-scale integration of sub-20 nm sacrificial nanofluidic channels for manipulating and imaging single DNA moleculesC. WangS.W. Namet al.2013IEDM 2013
Patterning of CMOS device structures for 40-80nm pitches and beyondSebastian U. EngelmannR.M. Martinet al.2012SPIE Advanced Lithography 2012
A 0.021 μm2 trigate SRAM cell with aggressively scaled gate and contact pitchMichael A. GuillornJosephine Changet al.2011VLSI Technology 2011
Systematic studies on reactive ion etch-induced deformations of organic underlayersMartin GloddeSebastian Engelmannet al.2011SPIE Advanced Lithography 2011