Synthesis, characterization, and lithographic behavior of methylated poly(4-hydroxystyrene)
- D.R. McKean
- T.P. Sauer
- et al.
- 1990
- ACS Division of Polymer Chemistry Washington DC Meeting 1990
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120 results for William D. Hinsberg
Modified polyhydroxystyrenes as matrix resins for dissolution inhibition type photoresists
- G. Pawlowski
- T.P. Sauer
- et al.
- 1990
- Microlithography 1990
Zero-Misalignment lithographic process using a photoresist with wavelength-selected tone
- William D. Hinsberg
- Scott A. MacDonald
- et al.
- 1989
- Proceedings of SPIE 1989
Use of a quartz crystal microbalance rate monitor to examinfthotofroduct effects on resistthssolution
- W.D. Hinsberg
- C.G. Willson
- et al.
- 1989
- Proceedings of SPIE 1989
Effect of developer composition on photoresist performance
- William D. Hinsberg
- Monica L. Gutierrez
- 1989
- Proceedings of SPIE 1989
Fundamental understanding of chemical processes in extreme ultraviolet resist materials
- Oleg Kostko
- Bo Xu
- et al.
- 2018
- Journal of Chemical Physics
Integration of directed self-assembly with 193 nm lithography
- Daniel P. Sanders
- Joy Cheng
- et al.
- 2010
- J. Photopolym. Sci. Tech.
Directed self-assembly on sparse chemical patterns for lithographic applications
- Joy Y. Cheng
- Alshakim Nelson
- et al.
- 2009
- J. Photopolym. Sci. Tech.
Numerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography
- William Hinsberg
- Frances A. Houle
- 2006
- J. Photopolym. Sci. Tech.
Design of protective topcoats for immersion lithography
- Robert D. Allen
- Phillip J. Brock
- et al.
- 2005
- J. Photopolym. Sci. Tech.