Publications

15 results for Eric Miller

Future of plasma etching for microelectronics: Challenges and opportunities
- - Gottlieb S. Oehrlein
  - Stephan M. Brandstadter
  - et al.
- 2024
- Journal of Vacuum Science and Technology B
Development of Epitaxial SiGeB as a Test Vehicle to Evaluate Source-Drain Etchout during Channel Release of Gate-all-Around Devices: Topic/category: AEPM: Advanced Equipment Processes and Materials
- - M. Nasseri
  - C. Durfee
  - et al.
- 2024
- ASMC 2024
Scaling opportunities for Gate-All-Around: A patterning perspective
- - I. Seshadri
  - E. Miller
  - et al.
- 2023
- IEDM 2023
Functional Testing of AI Cores through Thinned 3D I/O Buffer Dies in 3D Die-Stacked Modules
- - Mukta Farooq
  - Arvind Kumar
  - et al.
- 2022
- ECTC 2022
Plasma-based area selective deposition for extreme ultraviolet resist defectivity reduction and process window improvement
- - Katie Lutker-Lee
  - Jennifer Church
  - et al.
- 2022
- Journal of Vacuum Science and Technology B
Vertical-Transport Nanosheet Technology for CMOS Scaling beyond Lateral-Transport Devices
- - H. Jagannathan
  - B. Anderson
  - et al.
- 2021
- IEDM 2021
Contact local CD uniformity optimization through etch shrink
- - Eric Miller
  - Junling Sun
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch
- - Jennifer Church
  - Luciana Meli
  - et al.
- 2020
- J. Micro/Nanolithogr. MEMS MOEMS
Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch
- - Jennifer Church
  - Luciana Meli
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Nitride etching with hydrofluorocarbons III: Comparison of C₄H₉F and CH₃F for low-k′ nitride spacer etch processes
- - Hiroyuki Miyazoe
  - Nathan Marchack
  - et al.
- 2018
- JVSTB