Publications

40 results for Timothy Brunner

Characterization and mitigation of overlay error on silicon wafers with nonuniform stress
- - T.A. Brunner
  - V. Menon
  - et al.
- 2014
- SPIE Advanced Lithography 2014
Layout optimization method to equalize the best-focus position of different patterns
- - Jaione Tirapu-Azpiroz
  - Alan E. Rosenbluth
  - et al.
- 2014
- J. Micro/Nanolithogr. MEMS MOEMS
CD optimization methodology for extending optical lithography
- - C. Wong
  - G. Seevaratnam
  - et al.
- 2013
- SPIE Advanced Lithography 2013
Characterization of wafer geometry and overlay error on silicon wafers with nonuniform stress
- - Timothy A. Brunner
  - Vinayan C. Menon
  - et al.
- 2013
- Journal of Micro/Nanolithography, MEMS, and MOEMS
Lens heating challenges for negative tone develop layers with freeform illumination: A comparative study of experimental vs. simulated results
- - Scott Halle
  - Michael Crouse
  - et al.
- 2012
- SPIE Advanced Lithography 2012
Dose-focus monitor technique using CD-SEM and application to local variation analysis
- - Shoji Hotta
  - Timothy Brunner
  - et al.
- 2012
- SPIE Advanced Lithography 2012
Dose-focus monitor technique using a critical-dimension scanning electron microscope and its application to local variation analysis
- - Shoji Hotta
  - Timothy Brunner
  - et al.
- 2012
- J. Micro/Nanolithogr. MEMS MOEMS
Understanding the trade-offs of thinner binary mask absorbers
- - Jaione Tirapu-Azpiroz
  - Gregory McIntyre
  - et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry gratings
- - Alok Vaid
  - Matthew Sendelbach
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Toward perfect on-wafer pattern placement: Stitched overlay exposure tool characterization
- - Christopher P. Ausschnitt
  - Timothy A. Brunner
  - et al.
- 2010
- SPIE Advanced Lithography 2010