Publications

33 results for Anuja De Silva

Dry Deposition and Dry Development of Metal Oxide Based Photoresist
- - Nizan Kenane
  - Anuja De Silva
  - et al.
- 2024
- J. Photopolym. Sci. Tech.
EUV single exposure via patterning at aggressive pitch
- - Jing Guo
  - Jennifer Church
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch
- - Jennifer Church
  - Luciana Meli
  - et al.
- 2020
- J. Micro/Nanolithogr. MEMS MOEMS
Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance
- - Chris Robinson
  - Cody Murray
  - et al.
- 2020
- SPIE Advanced Lithography 2020
EUV chemically amplified resist component distribution and efficiency for stochastic defect control
- - Dario Goldfarb
  - Olivia Wang
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Material and process improvements towards sub 36nm pitch EUV single exposure
- - Karen Petrillo
  - Dave Hetzer
  - et al.
- 2019
- ANTS 2019
Investigation of mask absorber induced image shift in EUV lithography
- - Martin Burkhardt
  - Anuja De Silva
  - et al.
- 2019
- SPIE Advanced Lithography 2019
Fundamentals of resist stochastics effect for single-expose EUV patterning
- - Anuja De Silva
  - Luciana Meli
  - et al.
- 2019
- SPIE Advanced Lithography 2019
Patterning material challenges for improving euv stochastics
- - Anuja De Silva
  - Luciana Meli
  - et al.
- 2019
- J. Photopolym. Sci. Tech.
Defect detection strategies and process partitioning for single-expose EUV patterning
- - Luciana Meli
  - Karen Petrillo
  - et al.
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS