Formation of a stratified lanthanum silicate dielectric by reaction with Si(001)
- M. Copel
- E. Cartier
- et al.
- 2001
- Applied Physics Letters
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182 results for Eduard Cartier
Ultrathin high-K gate stacks for advanced CMOS devices
- E. Gusev
- D.A. Buchanan
- et al.
- 2001
- Technical Digest - International Electron Devices Meeting
Thermally stable ultra-thin Zr silicate for CMOS applications
- Z. Luo
- T.P. Ma
- et al.
- 2001
- International Symposium on VLSI Technology, Systems, and Applications, Proceedings
Hot carrier transport effects in Al2O3-based metal-oxide-semiconductor structures
- R. Ludeke
- M.T. Cuberes
- et al.
- 2000
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Atomic beam deposition of lanthanum- and yttrium-based oxide thin films for gate dielectrics
- S. Guha
- E. Cartier
- et al.
- 2000
- Applied Physics Letters
Local transport and trapping issues in Al2O3 gate oxide structures
- R. Ludeke
- M.T. Cuberes
- et al.
- 2000
- Applied Physics Letters
High-resolution depth profiling in ultrathin Al2O3 films on Si
- E. Gusev
- M. Copel
- et al.
- 2000
- Applied Physics Letters
Determination of the energy-dependent conduction band mass in SiO2
- R. Ludeke
- E. Cartier
- et al.
- 1999
- Applied Physics Letters
Defects in thermal oxide studied by photoluminescence spectroscopy
- Hiroyuki Nishikawa
- James H. Stathis
- et al.
- 1999
- Applied Physics Letters
CMOS and memories: From 100 nm to 10 nm!
- Sandip Tiwari
- Paul M. Solomon
- et al.
- 1999
- Microelectronic Engineering