Publications

34 results for Martin Burkhardt

Low-n absorber EUV masks: mask manufacturing assessment through process characterization and optimization with early look at EUV Low-NA and High-NA imaging performance
- - Henry Kamberian
  - Jed Rankin
  - et al.
- 2024
- SPIE Photomask Technology + EUV Lithography 2024
Scaling opportunities for Gate-All-Around: A patterning perspective
- - I. Seshadri
  - E. Miller
  - et al.
- 2023
- IEDM 2023
EUV sub-resolution assist feature impact: experimental and simulation evaluation
- - Zheng Chen
  - Martin Burkhardt
  - et al.
- 2023
- OEN 2023
Impact of high-NA half-field to full-field overlay performance by Monte Carlo simulations
- - Romain Lallement
  - Daniel Schmidt
  - et al.
- 2023
- OEN 2023
Focus considerations of design pitches and absorber choice for EUV random logic
- - Martin Burkhardt
  - Zheng Chen
  - et al.
- 2022
- OEN 2022
EUV single exposure via patterning at aggressive pitch
- - Jing Guo
  - Jennifer Church
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Effect of high NA "half-field" printing on overlay error
- - Allen Gabor
  - Martin Burkhardt
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch
- - Jennifer Church
  - Luciana Meli
  - et al.
- 2020
- J. Micro/Nanolithogr. MEMS MOEMS
Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch
- - Jennifer Church
  - Luciana Meli
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Investigation of mask absorber induced image shift in EUV lithography
- - Martin Burkhardt
  - Anuja De Silva
  - et al.
- 2019
- SPIE Advanced Lithography 2019