Scaling Single Expose EUV Gate LER Through Source-Resist-Mask Co-optimization
- Gopal Kenath
- Martin Burkhardt
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Publications
5 results for Karen Petrillo
Exploring the Limits of Contact Hole Patterning with High NA EUV Lithography
- Dario Goldfarb
- Zheng Chen
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
High Volume Manufacturing Innovations for Metal-Oxide Resist Patterning
- Nicholas Latham
- Jennifer Church
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Effect of composition uniformity in the polymer chain of EUV photoresist on lithographic performance
- Euijin Ko
- Yoorim Jang
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Exploration of pillar local CDU improvement options for AI applications
- Charlie Liu
- Hao Tang
- et al.
- 2020
- SPIE Advanced Lithography 2020