Multiple breakdown phenomena and modeling for non-uniform dielectric systemsErnest Y. WuBaozhen Liet al.2014IEDM 2014
TDDB at low voltages: An electrochemical perspectiveRamachandran MuralidharThomas M. Shawet al.2014IRPS 2014
A time-dependent clustering model for non-uniform dielectric breakdownErnest Y. WuB. Liet al.2013IEDM 2013
Invasion percolation model for abnormal TDDB characteristic of ULK dielectrics with Cu interconnect at advanced technology nodesF. ChenMichael Shinoskyet al.2011IRPS 2011
Post-breakdown statistics and acceleration characteristics in high-K dielectric stacksErnest WuJordi Suneet al.2011IRPS 2011
Critical ultra low-k TDDB reliability issues for advanced CMOS technologiesF. ChenM. Shinoskyet al.2009IRPS 2009
Line edge roughness and spacing effect on low-k TDDB characteristicsF. ChenJ.R. Lloydet al.2008IRPS 2008