Decomposition of interfacial SiO2 during HfO2 deposition
- M. Copel
- M.C. Reuter
- 2003
- Applied Physics Letters
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Physical and electrical properties of reactive molecular-beam-deposited aluminum nitride in metal-oxide-silicon structures
- L.Å. Ragnarsson
- N.A. Bojarczuk
- et al.
- 2003
- Journal of Applied Physics
Selective desorption of interfacial SiO2
- M. Copel
- 2003
- Applied Physics Letters
Characterization of silicate/Si(001) interfaces
- M. Copel
- E. Cartier
- et al.
- 2002
- Applied Physics Letters
Interfacial oxide formation and oxygen diffusion in rare earth oxide-silicon epitaxial heterostructures
- V. Narayanan
- S. Guha
- et al.
- 2002
- Applied Physics Letters
High temperature stability of Al2O3 dielectrics on Si: Interfacial metal diffusion and mobility degradation
- S. Guha
- E. Gusev
- et al.
- 2002
- Applied Physics Letters
Interface reactions in ZrO 2 based gate dielectric stacks
- M. Gribelyuk
- A.C. Callegari
- et al.
- 2002
- Journal of Applied Physics
A-site surface termination in strontium titanate single crystals
- A.G. Schrott
- J. Misewich
- et al.
- 2001
- Applied Physics Letters
Molecular-beam-deposited yttrium-oxide dielectrics in aluminum-gated metal-oxide-semiconductor field-effect transistors: Effective electron mobility
- L.Å. Ragnarsson
- S. Guha
- et al.
- 2001
- Applied Physics Letters
Robustness of ultrathin aluminum oxide dielectrics on Si(001)
- M. Copel
- E. Cartier
- et al.
- 2001
- Applied Physics Letters