Materials characterization for multilayer electron beam lithography
- Ravi Bonam
- John G. Hartley
- 2016
- JVSTB
Publications
6 results for John G. Hartley
Large area three dimensional structure fabrication using multilayer electron beam lithography
- Ravi Bonam
- John G. Hartley
- 2016
- JVSTB
Revisit pattern collapse for 14nm node and beyond
- Kenji Yoshimoto
- Craig Higgins
- et al.
- 2011
- SPIE Advanced Lithography 2011
Thorough characterization of a EUV mask
- Hiroyuki Mizuno
- Gregory McIntyre
- et al.
- 2009
- Photomask and Next-Generation Lithography Mask Technology 2009
Initial experience establishing a EUV baseline lithography process for manufacturability assessment
- O.R. Wood II
- D. Back
- et al.
- 2007
- SPIE Advanced Lithography 2007
A year in the life of an immersion lithography alpha tool at albany NanoTech
- Michael Tittnich
- John Hartley
- et al.
- 2006
- SPIE Advanced Lithography 2006