High performance bulk planar 20nm CMOS technology for low power mobile applicationsHuiling ShangSameer Jainet al.2012VLSI Technology 2012
A manufacturable dual channel (Si and SiGe) high-k metal gate CMOS technology with multiple oxides for high performance and low power applicationsS. KrishnanU. Kwonet al.2011IEDM 2011
Mechanism of VFB / VTH shift in Dysprosium incorporated HfO2 gate dielectric n-Type Metal-Oxide-Semiconductor devicesTackhwi LeeKisik Choiet al.2011Journal of Vacuum Science and Technology B
Stress liner proximity technique to enhance carrier mobility in high-κ metal gate MOSFETsDechao GuoKathryn Schonenberget al.2009MRS Fall Meeting 2009
Gate length scaling and high drive currents enabled for high performance SOI technology using high-κ/metal gateK. HensonH. Buet al.2008IEDM 2008