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Boron redistribution in arsenic-implanted silicon and short-channel effects in metal-oxide-semiconductor field effect transistorsD.K. SadanaA. Acovicet al.1992Applied Physics Letters
Selective growth of Si/SiGe resonant tunneling diodes by atmospheric pressure chemical vapor depositionA. ZaslavskyD.A. Grützmacheret al.1992Applied Physics Letters
Characterization of devices fabricated in films grown at low temperature by atmospheric pressure CVDT.O. SedgwickV.P. Kesanet al.1991IEDM 1991