Publications

9 results for Jed Rankin

Low-n absorber EUV masks: mask manufacturing assessment through process characterization and optimization with early look at EUV Low-NA and High-NA imaging performance
- - Henry Kamberian
  - Jed Rankin
  - et al.
- 2024
- SPIE Photomask Technology + EUV Lithography 2024
Printability and actinic AIMS review of programmed mask blank defects
- - Erik Verduijn
  - Pawitter Mangat
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Printability of buried extreme ultraviolet lithography photomask defects
- - Kazunori Seki
  - Takeshi Isogawa
  - et al.
- 2016
- J. Micro/Nanolithogr. MEMS MOEMS
EUV photomask defects: What prints, what doesn't, and what is required for HVM
- - Jed Rankin
  - Zhengqing John Qi
  - et al.
- 2015
- SPIE Photomask Technology + EUV Lithography 2015
Two-dimensional mask effects at the 14 nm logic node
- - A.E. Zweber
  - A.E. McGuire
  - et al.
- 2013
- SPIE Photomask Technology 2013
Your worst Nightmare - Inspection of aggressive OPC on 14 nm masks with emphasis on defect sensitivity and wafer defect print predictability
- - Karen D. Badger
  - Michael Hibbs
  - et al.
- 2013
- SPIE Photomask Technology 2013
Using pattern shift to avoid blank defects during EUVL mask fabrication
- - Yoshiyuki Negishi
  - Yuki Fujita
  - et al.
- 2013
- Photomask and Next-Generation Lithography Mask Technology 2013
Improving the power-performance of multicore processors through optimization of lithography and thermal processing
- - A. Gabor
  - T.A. Brunner
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Optimization of silicon technology for the IBM System z9
- - Daniel J. Poindexter
  - Scott R. Stiffler
  - et al.
- 2007
- IBM J. Res. Dev