Printability and actinic AIMS review of programmed mask blank defects
- Erik Verduijn
- Pawitter Mangat
- et al.
- 2017
- SPIE Advanced Lithography 2017
Publications
11 results for Obert Wood
Enhancing resolution with pupil filtering for projection printing systems with fixed or restricted illumination angular distribution
- Greg McIntyre
- Leon Teeuwen
- et al.
- 2013
- SPIE Advanced Lithography 2013
EUV OPC for 56 nm metal pitch
- Martin Burkhardt
- Matt Colburn
- et al.
- 2011
- SPIE Advanced Lithography 2011
Revisit pattern collapse for 14nm node and beyond
- Kenji Yoshimoto
- Craig Higgins
- et al.
- 2011
- SPIE Advanced Lithography 2011
Thorough characterization of a EUV mask
- Hiroyuki Mizuno
- Gregory McIntyre
- et al.
- 2009
- Photomask and Next-Generation Lithography Mask Technology 2009
Modeling and experiments of non-telecentric thick mask effects for EUV lithography
- Gregory McIntyre
- Chiew-Seng Koay
- et al.
- 2009
- SPIE Advanced Lithography 2009
Exposure tool settings and OPC strategies for EUV Lithography at the 16nm node
- Yunfei Deng
- Jongwook Kye
- et al.
- 2009
- SPIE Advanced Lithography 2009
Flare evaluation of ASML alpha demo tool
- Hiroyuki Mizuno
- Gregory McIntyre
- et al.
- 2009
- SPIE Advanced Lithography 2009
Are extreme ultraviolet resists ready for the 32 nm node?
- Karen Petrillo
- Yayi Wei
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Initial experience establishing a EUV baseline lithography process for manufacturability assessment
- O.R. Wood II
- D. Back
- et al.
- 2007
- SPIE Advanced Lithography 2007