Implantation damage and the anomalous transient diffusion of ion-implanted boronAlwin E. MichelW. Rauschet al.1987Applied Physics Letters
Rapid annealing and the anomalous diffusion of ion implanted boron into siliconAlwin E. MichelW. Rauschet al.1987Applied Physics Letters
Uniformity characterization of an RTP systemJeffrey C. GelpeyPaul O. Stumpet al.1987Nuclear Inst. and Methods in Physics Research, B