Publications

57 results for Matthew Colburn

DSA patterning options for logics and memory applications
- - Chi Chun Liu
  - Elliott Franke
  - et al.
- 2017
- SPIE Advanced Lithography 2017
A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels
- - Ruilong Xie
  - Pietro Montanini
  - et al.
- 2016
- IEDM 2016
Design technology co-optimization assessment for directed self-Assembly-based lithography: Design for directed self-Assembly or directed self-Assembly for design
- - Kafai Lai
  - Chi Chun Liu
  - et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
FINFET technology featuring high mobility SiGe channel for 10nm and beyond
- - Dechao Guo
  - G. Karve
  - et al.
- 2016
- VLSI Technology 2016
BEOL process integration for the 7 nm technology node
- - T. Standaert
  - Genevieve Beique
  - et al.
- 2016
- IITC/AMC 2016
Lithographic qualification of high-Transmission mask blank for 10nm node and beyond
- - Yongan Xu
  - Tom Faure
  - et al.
- 2016
- SPIE Advanced Lithography 2016
High chi block copolymer DSA to improve pattern quality for FinFET device fabrication
- - Hsinyu Tsai
  - Hiroyuki Miyazoe
  - et al.
- 2016
- SPIE Advanced Lithography 2016
DSA via hole shrink for advanced node applications
- - Cheng Chi
  - Chi Chun Liu
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Thermomechanical behavior of EUV pellicle under dynamic exposure conditions
- - Dario Goldfarb
  - Max O. Bloomfield
  - et al.
- 2016
- SPIE Advanced Lithography 2016
DSA patterning options for FinFET formation at 7nm node
- - Chi Chun Liu
  - Elliott Franke
  - et al.
- 2016
- SPIE Advanced Lithography 2016