Accurate performance evaluation for the horizontal nanosheet standard-cell design space beyond 7nm technology
- Yoo-Mi Lee
- Myung-Hee Na
- et al.
- 2017
- IEDM 2017
Conference paper
Publications
28 results for L. Liebmann
Design intent optimization at the beyond 7nm node: The intersection of DTCO and EUVL stochastic mitigation techniques
- Michael Crouse
- L. Liebmann
- et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paperA 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels
- Ruilong Xie
- Pietro Montanini
- et al.
- 2016
- IEDM 2016
Conference paper10nm FINFET technology for low power and high performance applications
- D. Guo
- H. Shang
- et al.
- 2014
- ICSICT 2014
Conference paperA designer's guide to subresolution lithography: Enabling the impossible to get to the 14-nm node
- Lars Liebmann
- J. Andres Torres
- 2013
- IEEE Design and Test
PaperCo-optimization of circuits, layout and lithography for predictive technology scaling beyond gratings
- Tejas Jhaveri
- Vyacheslav Rovner
- et al.
- 2010
- IEEE TCADIS
PaperCompensating non-optical effects using electrically-driven optical proximity correction
- Shayak Banerjee
- Kanak B. Agarwal
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperMastering double exposure process window aware OPC by means of virtual targets
- Henning Haffner
- Zachary Baum
- et al.
- 2006
- SPIE Photomask Technology 2006
Conference paperHigh performance 65 nm SOI technology with dual stress liner and low capacitance SRAM cell
- E. Leobandung
- H. Nayakama
- et al.
- 2005
- VLSI Technology 2005
Conference paperIntegrating DfM components into a cohesive design-to-silicon solution
- Lars Liebmann
- Dan Maynard
- et al.
- 2005
- Microlithography 2005
Conference paper