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198 results for Christian Lavoie

Mechanisms for enhanced C54-TiSi₂ formation in Ti-Ta alloy films on single-crystal Si
- - A. Quintero
  - M. Libera
  - et al.
- 1999
- Journal of Materials Research
Evidence of a two-stage reaction mechanism in sputter deposited Nb/Al multilayer thin-films studied by in situ synchrotron X-ray diffraction
- - G.A. Lucadamo
  - K. Barmak
  - et al.
- 1999
- Materials Letters
In situ characterization of titanium silicide formation: The effect of Mo interlayer, temperature ramp-rate, and annealing atmosphere
- - S.-L. Zhang
  - C. Lavoie
  - et al.
- 1999
- Journal of Applied Physics
Enhanced thermal stability of C49 TiSi₂ in the presence of aluminum
- - S.-L. Zhang
  - F.M. D'Heurle
  - et al.
- 1998
- Applied Physics Letters
Is selective CVD an improvement for the titanium silicide process in sub-quarter micron technology? A phase formation study using x-ray diffraction
- - R.A. Roy
  - Cryil Cabral Jr.
  - et al.
- 1998
- MRS Spring Meeting 1998
Templating Effects On C54-Tisi₂ Formation In Ternary Reactions.
- - A. Quintero
  - M. Libera
  - et al.
- 1998
- Microscopy and Microanalysis
Is selective CVD an improvement for the titanium silicide process in sub-quarter micron technology? A phase formation study using x-ray diffraction
- - R.A. Roy
  - Cryil Cabral Jr.
  - et al.
- 1998
- MRS Spring Meeting 1998
Low temperature formation of C54-TiSi₂ using titanium alloys
- - C. Cabral Jr.
  - L. Clevenger
  - et al.
- 1997
- Applied Physics Letters
Surface roughening during titanium silicide formation: A comparison between Si(100) and poly-Si substrates
- - C. Lavoie
  - R. Martel
  - et al.
- 1996
- MRS Fall Meeting 1996
Effect of growth conditions on surface roughening of relaxed InGaAs on GaAs
- - T. Pinnington
  - C. Lavoie
  - et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures