Publications

2 results for Scott Halle

Evaluation of High NA EUV for Subtractive Interconnect Patterning in Advanced Nodes
- - Chris Penny
  - Joe Lee
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Accelerating High NA EUV Lithography Insertion for Interconnect Scaling and Beyond: Performance, Cost, and Future Prospects
- - Luciana Meli
  - Indira Seshadri
  - et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025