Small angle x-ray scattering metrology for sidewall angle and cross section of nanometer scale line gratings
- Tengjiao Hu
- Ronald L. Jones
- et al.
- 2004
- Journal of Applied Physics
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48 results for Qinghuang Lin
Porous ILD process development for sub 100nm integration
- K. Malone
- S.T. Chen
- et al.
- 2003
- ADMETA 2003
Does line edge roughness matter?: FEOL and BEOL perspectives
- Qinghuang Lin
- Chuck Black
- et al.
- 2003
- Microlithography 2003
Building high-performance chemically amplified resists with polymer blends
- Qinghuang Lin
- John Simons
- et al.
- 2002
- Microlithography 2002
Application of blends and side chain Si-O copolymers as high etch resistant sub 100 nm E-beam resists
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Characterization of thin and ultrathin polymer and resist films
- Dario L. Goldfarb
- Qinhuang Lin
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Line edge roughness in positive-tone chemically amplified resists: Effect of additives and processing conditions
- Qinghuang Lin
- Dario L. Goldfarb
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Feature-shape and line-edge roughness measurement of deep sub-micron lithographic structures using small-angle neutron scattering
- Eric K. Lin
- Wen-li Wu
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
When is bilayer thin-film imaging suitable: Comparison with single layer resists
- Scott Halle
- Alan Thomas
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Small angle neutron scattering measurements of nanoscale lithographic features
- Wen-Li Wu
- Eric K. Lin
- et al.
- 2000
- Journal of Applied Physics