Aluminum dual damascene metallization for 0.175 μm DRAM generations and beyond
- R.F. Schnabel
- L. Clevenger
- et al.
- 2000
- Microelectronic Engineering
Publications
2 results for Z.G. Lu
Dielectric anti-reflection coating application in a 0.175 μm dual-damascene process
- G.Y. Lee
- Z.G. Lu
- et al.
- 1998
- IITC 1998