Thermomechanical distortions of the PREVAIL mask system during exposureP.-T. LeeC. Martinet al.2001Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Predicting in-plane distortion from electron-beam lithography on x-ray mask membranesD.L. LairdR. Engelstadet al.1996Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures