Publications

4 results for Ralph Dammel

Imaging capabilities of resist in deep ultraviolet liquid immersion interferometric lithography
- - Alex K. Raub
  - A. Frauenglass
  - et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Liquid immersion lithography - Evaluation of resist issues
- - William Hinsberg
  - Gregory Wallraff
  - et al.
- 2004
- Microlithography 2004
Deep-UV immersion interferometric lithography
- - Alex K. Raub
  - A. Frauenglass
  - et al.
- 2004
- SPIE Advanced Lithography 2004
Modified polyhydroxystyrenes as matrix resins for dissolution inhibition type photoresists
- - G. Pawlowski
  - T.P. Sauer
  - et al.
- 1990
- Microlithography 1990