Publications

28 results for Daniel Corliss

EUV mask challenges and requirements for ultimate single exposure interconnects
- - Chris Progler
  - Michael Green
  - et al.
- 2019
- SPIE Advanced Lithography 2019
LCDU improvement of EUV-patterned vias with DSA
- - Jing Guo
  - Dustin W. Janes
  - et al.
- 2019
- MEMS/NEMS/MOEMS 2019
Electrical validation of the integration of 193i and DSA for sub-20nm metal cut patterning
- - Chi Chun Liu
  - Richard Farrell
  - et al.
- 2019
- MEMS/NEMS/MOEMS 2019
Polymer brush as adhesion promoter for EUV patterning
- - Jing Guo
  - Anuja De Silva
  - et al.
- 2018
- SPIE Advanced Lithography 2018
Characterization and control of EUV scanner dose uniformity and stability
- - Chris Robinson
  - Daniel Corliss
  - et al.
- 2018
- SPIE Advanced Lithography 2018
The integration of 193i and DSA for BEOL metal cuts/blocks targeting sub-20nm tip-to-tip CD
- - Chi-Chun Liu
  - Yann Mignot
  - et al.
- 2018
- SPIE Advanced Lithography 2018
Stacked nanosheet gate-all-around transistor to enable scaling beyond FinFET
- - N. Loubet
  - T.B. Hook
  - et al.
- 2017
- VLSI Technology 2017
DSA patterning options for logics and memory applications
- - Chi Chun Liu
  - Elliott Franke
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Printability and actinic AIMS review of programmed mask blank defects
- - Erik Verduijn
  - Pawitter Mangat
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle
- - Cheng Chi
  - Chi Chun Liu
  - et al.
- 2017
- SPIE Advanced Lithography 2017