Thermally robust dual-work function ALD-MN x MOSFETs using conventional CMOS process flow
- D.-G. Park
- Z. Luo
- et al.
- 2004
- VLSI Technology 2004
Publications
6 results for H. Kim
High-capacity, self-assembled metal-oxide-semiconductor decoupling capacitors
- Charles T. Black
- Kathryn W. Guarini
- et al.
- 2004
- IEEE Electron Device Letters
Does line edge roughness matter?: FEOL and BEOL perspectives
- Qinghuang Lin
- Chuck Black
- et al.
- 2003
- Microlithography 2003
Process integration of self-assembled polymer templates into silicon nanofabrication
- K.W. Guarini
- C.T. Black
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
- H. Kim
- C. Cabral
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
The growth of tantalum thin films by plasma-enhanced atomic layer deposition and diffusion barrier properties
- H. Kim
- C. Cabral Jr.
- et al.
- 2002
- MRS Proceedings 2002