Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology
A set of key processes for nanometer-scale pattern transfer using a self-assembled polymer mask was developed and integrated. As a result, a variety of silicon nanostructures were built.
Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology
E. Burstein
Ferroelectrics
D.D. Awschalom, J.-M. Halbout
Journal of Magnetism and Magnetic Materials
A. Reisman, M. Berkenblit, et al.
JES