Corrosion-free dry etch patterning of magnetic random access memory stacks: Effects of ultraviolet illumination
- H. Cho
- K.-P. Lee
- et al.
- 2000
- Journal of Applied Physics
Paper
Publications
35 results for Jeffrey R. Childress
Effect of inert gas additive on Cl2-based inductively coupled plasma etching of NiFe and NiFeCo
- K.B. Jung
- H. Cho
- et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperCl2-based inductively coupled plasma etching of CoFeB, CoSm, CoZr and FeMn
- K.B. Jung
- H. Cho
- et al.
- 1999
- Materials Science and Engineering B: Solid-State Materials for Advanced Technology
PaperInductively coupled plasma etching of CoFeB, CoZr, CoSm and FeMn thin films in interhalogen mixtures
- H. Cho
- K.B. Jung
- et al.
- 1999
- Materials Science and Engineering B: Solid-State Materials for Advanced Technology
PaperPlasma etching of NiFe/Cu and NiMnSb/Al2O3 multilayers for sub-micron pattern definition
- K.B. Jung
- J. Hong
- et al.
- 1999
- Journal of Magnetism and Magnetic Materials
PaperParametric study of NiFe and NiFeCo high density plasma etching using CO/NH3
- K.B. Jung
- J. Hong
- et al.
- 1999
- JES
PaperRelative merits of [formula omitted] and [formula omitted] plasma chemistries for dry etching of magnetic random access memory device elements
- K.B. Jung
- H. Cho
- et al.
- 1999
- Journal of Applied Physics
Conference paperComparison of Cl2/He, Cl2/Ar, and Cl2/Xe plasma chemistries for dry etching of NiFe and NiFeCo
- K.B. Jung
- H. Cho
- et al.
- 1999
- JES
PaperInterhalogen Plasma Chemistries for the Etching of NiMnSb
- H. Cho
- K.B. Jung
- et al.
- 1999
- Electrochemical and Solid-State Letters
PaperPatterning of NiFe and NiFeCo in CO/NH3 high density plasmas
- K.B. Jung
- J. Hong
- et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper