Energy Distribution of Interface Traps in High-K Gated MOSFETs
- J.-P. Han
- E.M. Vogel
- et al.
- 2003
- VLSI Technology 2003
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76 results for E. Gusev
Ultrathin HfO2 films grown on silicon by atomic layer deposition for advanced gate dielectrics applications
- E. Gusev
- C. Cabral Jr.
- et al.
- 2003
- Microelectronic Engineering
Mobility enhancement in strained Si NMOSFETs with HfO2 gate dielectrics
- K. Rim
- E. Gusev
- et al.
- 2002
- VLSI Technology 2002
Hot-carrier charge trapping and reliability in high-K dielectrics
- Arvind Kumar
- Tak H. Ning
- et al.
- 2002
- VLSI Technology 2002
Low temperature metal organic chemical vapor deposition of aluminum oxide thin films for advanced CMOS gate dielectric applications
- Spyridon Skordas
- Filippos Papadatos
- et al.
- 2002
- MRS Proceedings 2002
Ultrathin high-K metal oxides on silicon: Processing, characterization and integration issues
- E. Gusev
- E. Cartier
- et al.
- 2001
- Microelectronic Engineering
Interfacial microstructure of NiSix/HfO2/SiOx/Si gate stacks
- M. Gribelyuk
- C. Cabral Jr.
- et al.
- 2007
- Thin Solid Films
Measurements of metal gate effective work function by x-ray photoelectron spectroscopy
- Yuri Lebedinskii
- Andrei Zenkevich
- et al.
- 2007
- Journal of Applied Physics
Advanced high-κ dielectric stacks with polySi and metal gates: Recent progress and current challenges
- Evgeni P. Gusev
- Vijay Narayanan
- et al.
- 2006
- IBM J. Res. Dev
Thermal ammonia nitridation on HfO2 and hafnium silicates thin films
- J.-J. Ganem
- I. Trimaille
- et al.
- 2006
- Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms