Effect of ionomer ion aggregation on contact charging
- A. Diaz
- D. Fenzel‐Alexander
- et al.
- 2003
- Journal of Polymer Science, Part B: Polymer Physics
Paper
Publications
17 results for D. Fenzel‐Alexander
Importance of Dissociated Ions in Contact Charging
- A. Diaz
- D. Fenzel-Alexander
- et al.
- 2002
- Langmuir
PaperContact Charging Characteristics of Styrene-Butyl Methacrylate Containing Dodecametallophosphate Salts
- A. Gutierrez
- D. Fenzel-Alexander
- et al.
- 2002
- Langmuir
PaperSilicon-containing resists for 157 nm applications
- Ratnam Sooriyakumaran
- Debra Fenzel-Alexander
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperIBM 193nm bilayer resist: Materials, lithographic performance and optimization
- Ranee Kwong
- P. Rao Varanasi
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Paper193 nm positive tone bilayer resist based on norbornene-maleic anhydride copolymers
- R. Sooriyakumaran
- D. Fenzel-Alexander
- et al.
- 2000
- Microlithography 2000
Conference paperHigh resolution 248 nm bilayer resist
- Q. Lin
- K.E. Petrillo
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Conference paperPositive bilayer resists for 248- and 193-nm lithography
- Ratnam Sooriyakumaran
- Gregory M. Wallraff
- et al.
- 1998
- Microlithography 1998
Conference paperEtch selectivity of 4SiMA: Hydroxystyrene based copolymers. silicon chemistry for bilayer resist systems
- G.M. Wallraff
- Carl E. Larson
- et al.
- 1998
- J. Photopolym. Sci. Tech.
PaperEllipsometric measurement of solid fluorocarbon film thickness on magnetic recording media
- Tom Karis
- George W. Tyndall
- et al.
- 1997
- Journal of Applied Physics
Paper