Energy Considerations in the Deposition of High-Quality Plasma-Enhanced CVD Silicon Dioxide
- E. Tierney
- J. Batey
- et al.
- 2019
- JES
Publications
7 results for J. Chapple-Sokol
Etching of copper in deionized water rinse
- J.P. Gambino
- J. Robbins
- et al.
- 2008
- IPFA 2008
Hydrogen incorporation in silicon nitride films deposited by remote electron-cyclotron-resonance chemical vapor deposition
- David E. Kotecki
- Jonathan D. Chapple-Sokol
- 1995
- Journal of Applied Physics
Polarization Effects of Fluorine on the Relative Permittivity in Polyimides
- G. Hougham
- G. Tesoro
- et al.
- 1994
- Macromolecules
Microwave properties of free-standing dielectric films
- W. Robertson
- G. Arjavalingam
- et al.
- 1992
- Electronics Letters
Response to "comment on 'E' centers and nitrogen-related defects in silicon dioxide films'"
- J.H. Stathis
- J. Chapple-Sokol
- et al.
- 1991
- Applied Physics Letters
E' centers and nitrogen-related defects in SiO2 films
- J.H. Stathis
- J. Chapple-Sokol
- et al.
- 1990
- Applied Physics Letters