Etch mechanism in the low refractive index silicon nitride plasma-enhanced chemical vapor deposition process
- Yue Kuo
- 1993
- Applied Physics Letters
Paper
Publications
46 results for Yue Kuo
Reactive ion etching processes for amorphous germanium alloys
- Y. Kuo
- 1993
- MRS Fall Meeting 1993
Conference paperA-Si thin film transistors using dilute-gas plasma-enhanced chemical vapor deposition
- S.L. Wright
- M.B. Rothwell
- et al.
- 1993
- Device Research Conference 1993
Conference paperReactive ion etching of sputter deposited tantalum with Cf4, Cf3Cl, and CHF3
- Yue Kuo
- 1993
- Japanese Journal of Applied Physics
PaperPlasma swelling of photoresist
- Yue Kuo
- 1993
- Japanese Journal of Applied Physics
PaperIVB-6 a-Si Thin Film Transistors Using Dilute-Gas Plasma-Enhanced Chemical Vapor Deposition
- S.L. Wright
- M.B. Rothwell
- et al.
- 1993
- IEEE Transactions on Electron Devices
PaperLarge area plasma enhanced chemical vapor deposition of nonstoichiometric silicon nitride
- Y. Kuo
- 1992
- MRS Proceedings 1992
Conference paperReactive ion etching technology in thin-film-transistor processing
- Y. Kuo
- 1992
- IBM J. Res. Dev
PaperReactive ion etch damages in inverted, trilayer thin-film transistor
- Yue Kuo
- 1992
- Applied Physics Letters
PaperA new thin film transistor structure and its processing method for liquid crystal displays
- Yue Kuo
- 1991
- IS&T/SPIE Electronic Imaging 1991
Conference paper