Principal Component Analysis of Optical Emission Spectroscopy and Mass Spectrometry: Application to Reactive Ion Etch Process Parameter Estimation Using Neural Networks
- Reza Shadmehr
- David Angell
- et al.
- 2019
- JES
Paper
Publications
5 results for D. Angell
Grazing angle optical emission interferometry for end-point detection
- David Angell
- Gottlieb S. Oehrlein
- 1991
- Applied Physics Letters
PaperCryogenic reactive ion etching of silicon in SF6
- Tim D. Bestwick
- Gottlieb S. Oehrlein
- et al.
- 1990
- Applied Physics Letters
PaperEtch tailoring through flexible end-point detection
- D. Angell
- G.S. Oehrlein
- 1990
- SPIE Processing Integration 1990
Conference paperStudy of oxygen addition to CF3Br reactive ion etching plasmas: Effects on silicon surface chemistry and etching behavior
- T.D. Bestwick
- G.S. Oehrlein
- et al.
- 1989
- Applied Physics Letters
Paper