Publications

11 results for T.D. Bestwick

Selective dry etching of germanium with respect to silicon and vice versa
- - G.S. Oehrlein
  - T.D. Bestwick
  - et al.
- 2019
- JES
Reactive ion etching of SiGe alloys using HBr
- - Tim D. Bestwick
  - Gottlieb S. Oehrlein
  - et al.
- 1991
- Applied Physics Letters
Interactive effects in the reactive ion etching of SiGe alloys
- - G.S. Oehrlein
  - Y. Zhang
  - et al.
- 1991
- Applied Physics Letters
Nonintrusive wafer temperature measurement using in situ ellipsometry
- - G.M.W. Kroesen
  - G.S. Oehrlein
  - et al.
- 1991
- Journal of Applied Physics
Photoluminescence characterization of plasma exposed silicon surfaces
- - A. Henry
  - B. Monemar
  - et al.
- 1991
- Journal of Applied Physics
Studies of the reactive ion etching of SiGe alloys
- - G.S. Oehriein
  - G.M.W. Kroesen
  - et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Selective dry etching of silicon with respect to germanium
- - G.S. Oehrlein
  - T.D. Bestwick
  - et al.
- 1990
- Applied Physics Letters
Cryogenic reactive ion etching of silicon in SF₆
- - Tim D. Bestwick
  - Gottlieb S. Oehrlein
  - et al.
- 1990
- Applied Physics Letters
Reactive ion etching of silicon using bromine containing plasmas
- - Tim D. Bestwick
  - Gottlieb S. Oehrlein
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Study of oxygen addition to CF₃Br reactive ion etching plasmas: Effects on silicon surface chemistry and etching behavior
- - T.D. Bestwick
  - G.S. Oehrlein
  - et al.
- 1989
- Applied Physics Letters