Photoresists for 193-nm lithography
- R.D. Allen
- G.M. Wallraff
- et al.
- 1997
- IBM J. Res. Dev
Paper
Publications
14 results for Roderick R. Kunz
Thin-film imaging: Past, present, prognosis
- David Seeger
- D.C. La Tulipe Jr.
- et al.
- 1997
- IBM J. Res. Dev
Paper193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system
- R.D. Allen
- G.M. Wallraff
- et al.
- 1995
- Microlithography 1995
Conference paperResolution and etch resistance of a family of 193 nm positive resists
- R.D. Allen
- I.Y. Wan
- et al.
- 1995
- J. Photopolym. Sci. Tech.
PaperMaterials evaluation of antireflective coatings for single-layer 193-nm lithography
- Roderick R. Kunz
- Robert D. Allen
- 1994
- Microlithography 1994
Conference paper193 nm resists and lithography
- Roderick R. Kunz
- Robert D. Allen
- et al.
- 1994
- Polymers for Advanced Technologies
PaperComparison of liquid- And vapor-phase silylation processes for 193-nm positive-tone lithography
- Mark A. Hartney
- Roderick R. Kunz
- et al.
- 1993
- Microlithography 1993
Conference paperAcid-catalyzed single-layer resists for ArF lithography
- Roderick R. Kunz
- Robert D. Allen
- et al.
- 1993
- Microlithography 1993
Conference paperDesigning high performance KrF and ArF single layer resists with methacrylate polymers
- Robert D. Allen
- Gregory M. Wallraff
- et al.
- 1993
- J. Photopolym. Sci. Tech.
PaperSensitive polysilane resists for bilayer lithography
- G.M. Wallraff
- R.D. Miller
- et al.
- 1991
- ACS Spring 1991
Conference paper