Impact of thin resist processes on post-etch LER
- Arpan P. Mahorowala
- Dario L. Goldfarb
- et al.
- 2003
- Microlithography 2003
Publications
109 results for Marie Angelopoulos
X-ray absorption spectroscopy to probe interfacial issues in photolithography
- Joseph L. Lenhart
- Daniel A. Fischer
- et al.
- 2003
- Microlithography 2003
Polyelectrolyte effects in model photoresist developer solutions: Roles of base concentration and added salts
- Vivek M. Prabhu
- Ronald L. Jones
- et al.
- 2003
- Microlithography 2003
Development of a new PSM film system for 157 nm extensible to high transmission 193 nm lithography
- Hans Becker
- Jay Chey
- et al.
- 2003
- SPIE Photomask Technology 2003
Incoherent neutron scattering and the dynamics of thin film photoresist polymers
- Christopher L. Soles
- Jack F. Douglas
- et al.
- 2003
- Journal of Applied Physics
Probing surface and bulk chemistry in resist films using near edge x-ray absorption fine structure
- Joseph L. Lenhart
- Ronald L. Jones
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Enhancement of KRS-XE for 50 keV advanced mask making applications
- Karen Petrillo
- David Medeiros
- et al.
- 2002
- SPIE Photomask Technology 2002
Early mask results of KRS-XE and current progress in improving sensitivity and etch resistance
- Christina Deverich
- Andrew Watts
- et al.
- 2002
- Photomask and Next-Generation Lithography Mask Technology 2002
Combinatorial methodologies offer potential for rapid research of photoresist materials and formulations
- Joseph L. Lenhart
- Ronald L. Jones
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Building high-performance chemically amplified resists with polymer blends
- Qinghuang Lin
- John Simons
- et al.
- 2002
- Microlithography 2002