Publications

11 results for Donis Flagello

Radiometric consistency in source specifications for lithography
- - Alan E. Rosenbluth
  - Jaione Tirapu Azpiroz
  - et al.
- 2008
- SPIE Advanced Lithography 2008
High-numerical-aperture effects in photoresist
- - Donis G. Flagello
  - Tom D. Milster
- 1997
- Applied Optics
Theory of high-NA imaging in homogeneous thin films
- - Donis G. Flagello
  - Tom Milster
  - et al.
- 1996
- Journal of the Optical Society of America A: Optics and Image Science, and Vision
Experimental verification of high numerical aperture effects in photoresist
- - Donis G. Flagello
  - Tom Milster
- 1994
- Microlithography 1994
Vector diffraction analysis of phase-mask imaging in photoresist films
- - Donis G. Flagello
  - Alan E. Rosenbluth
- 1993
- Microlithography 1993
Comparison of scalar and vector diffraction modelling for deep-UV lithography
- - Bruce W. Smith
  - Donis G. Flagello
  - et al.
- 1993
- Microlithography 1993
Three-dimensional modeling of high-numerical-aperture imaging in thin films
- - D. Flagello
  - Tom D. Milster
- 1992
- SPIE OE/LASE 1992
Understanding high numerical aperture optical lithography
- - D. Flagello
  - Alan E. Rosenbluth
  - et al.
- 1992
- Microelectronic Engineering
Polymeric optical waveguides
- - J.M. Hagerhorst-Trewhella
  - J. Gelorme
  - et al.
- 1989
- Proceedings of SPIE 1989
Practical characterization of 0.5 μm optical lithography
- - Donis G. Flagello
  - Andrew T. S. Pomerene
- 1989
- Proceedings of SPIE 1989