Publications

9 results for William Holber

Copper deposition by electron cyclotron resonance plasma
- - A. Sugerrnan
  - F.E. Turene
  - et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Wavelength-modulated interferometric thermometry for improved substrate temperature measurement
- - K.L. Saenger
  - F. Tong
  - et al.
- 1992
- Review of Scientific Instruments
A fluid description for the discharge equilibrium of a divergent electron cyclotron resonance plasma source
- - G. Guan
  - M.E. Mauel
  - et al.
- 1992
- Physics of Fluids B
GaAs-oxide removal using an electron cyclotron resonance hydrogen plasma
- - Z. Lu
  - M.T. Schmidt
  - et al.
- 1991
- Applied Physics Letters
The effects of substrate bias on plasma parameters in an electron cyclotron resonance plasma reactor
- - John B.O. Caughman
  - William M. Holber
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Doppler profile measurement of Ar and Ar⁺ translational energies in a divergent magnetic field electron cyclotron resonance source
- - John S. McKillop
  - John C. Forster
  - et al.
- 1989
- Applied Physics Letters
Plasma characterization for a divergent field electron cyclotron resonance source
- - John Forster
  - William Holber
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Optical emission characterization of a divergent magnetic field electron cyclotron resonance source
- - John S. McKillop
  - John C. Forster
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Anisotropic electrical properties of epitaxial YBa₂Cu₃O_7-δ films on (110) SrTiO₃
- - A. Gupta
  - G. Koren
  - et al.
- 1989
- Physica C: Superconductivity and its applications