Publications

51 results for D.A. Buchanan

Electron effective mass enhancement in ultrathin gate-oxide Si-MOSFETs
- - M. Dragosavac
  - D.J. Paul
  - et al.
- 2004
- ICPS Physics of Semiconductors 2004
Charge trapping and detrapping in HfO₂ high-κ MOS capacitors using internal photoemission
- - D. Felnhofer
  - E. Gusev
  - et al.
- 2005
- INFOS 2005
Electron effective mass in ultrathin oxide silicon MOSFET inversion layers
- - M. Dragosavac
  - D.J. Paul
  - et al.
- 2005
- Semiconductor Science and Technology
Interface reactions in ZrO ₂ based gate dielectric stacks
- - M. Gribelyuk
  - A.C. Callegari
  - et al.
- 2002
- Journal of Applied Physics
Ultrathin high-K metal oxides on silicon: Processing, characterization and integration issues
- - E. Gusev
  - E. Cartier
  - et al.
- 2001
- Microelectronic Engineering
Group IVB metal oxides high permittivity gate insulators deposited from anhydrous metal nitrates
- - Tiezhong Ma
  - Stephen A. Campbell
  - et al.
- 2001
- IEEE Transactions on Electron Devices
Ultrathin high-K gate stacks for advanced CMOS devices
- - E. Gusev
  - D.A. Buchanan
  - et al.
- 2001
- Technical Digest - International Electron Devices Meeting
80 nm poly-silicon gated n-FETs with ultra-thin Al₂O₃ gate dielectric for ULSI applications
- - D.A. Buchanan
  - E. Gusev
  - et al.
- 2000
- IEDM 2000
Low temperature chemical vapor deposition of ZrO₂ on Si(100) using anhydrous zirconium(IV) nitrate
- - Ryan C. Smith
  - Noel Hoilien
  - et al.
- 2000
- JES
Scaling the gate dielectric: materials, integration, and reliability
- - D.A. Buchanan
- 1999
- IBM J. Res. Dev