Fully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization
- R. Viswanathan
- R.E. Acosta
- et al.
- 1989
- Microelectronic Engineering
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3 results for R. Fair
Electrical resistivity and radiation damage in boro-hydro-nitride x-ray lithography mask substrates
- S.S. Dana
- J. Batey
- et al.
- 1987
- Microelectronic Engineering
Distortion of masks for x-ray lithography
- R.E. Acosta
- J.R. Maldonado
- et al.
- 1985
- Microelectronic Engineering