A new mask lithography tool for advanced mask manufacturing
- B.J. Grenon
- H.C. Hamaker
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- 1995
- Microelectronic Engineering
Paper
Publications
5 results for B.J. Grenon
Impact of attenuated mask topography on lithographic performance
- Richard A. Ferguson
- William J. Adair
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- 1994
- Microlithography 1994
Conference paperA comparison of the E-beam sensitivities and relative O2-plasma stabilities of organosilicon polymers.Part III. Lithographic characteristics of poly-1,1,3-trimethyl-1-sila - and poly-1,1,3,3-tetramethyl-1,3- disilacyclobutenes and related silmethylene polymers
- E. Babich
- J. Paraszczak
- et al.
- 1989
- Microelectronic Engineering
PaperDiazopolysiloxanes: Unique imageable barrier layers
- E. Babich
- J.M. Shaw
- et al.
- 1986
- Microelectronic Engineering
PaperA comparison of the electron beam sensitivities and relative oxygen plasma etch rates of various organosilicon polymers
- E. Babich
- J. Paraszczak
- et al.
- 1985
- Microelectronic Engineering
Paper