PaperSub-μm, planarized, Nb-AlOx-Nb Josephson process for 125 mm wafers developed in partnership with Si technologyM.B. Ketchen, D.J. Pearson, et al.Applied Physics Letters
PaperDetermination of the coherence length in high-mobility semiconductor- coupled Josephson weak linksA.W. KleinsasserJournal of Applied Physics
PaperSmall silicon memories: Confinement, single-electron, and interface state considerationsS. Tiwari, J.A. Wahl, et al.Applied Physics A: Materials Science and Processing
Conference paperCurrents, surface potentials, and defect generation in 1.2-1.5 nm oxide MOSFETsS. Tiwari, J.J. Welser, et al.DRC 1998
