William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
An improved analytical formula for the drift velocities of hot electrons and holes in semiconductors is suggested. Calculated results from the model show striking agreements with the available experiments. Unlike the earlier ones, the model predicts the low-field peak velocity characteristics very well, and appears to exhibit wide applicability. It is claimed to be one of the most general models available in the literature, for which attempts are made to provide a theoretical basis. © 1992.
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992
William G. Van der Sluys, Alfred P. Sattelberger, et al.
Polyhedron