Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A 600-MHz above-resonance circulator operating at 4.2 K has been constructed and successfully tested. Its high isolation (>30 dB), extremely low insertion loss (<0.1 dB), low VSWR (<1.1), and acceptable instantaneous bandwidth (̴6 percent) make it a promising device for utilization in narrow-band very low-noise systems. Copyright © 1982 by The Institute of Electrical and Electronics Engineers, Inc.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A. Gangulee, F.M. D'Heurle
Thin Solid Films
Ming L. Yu
Physical Review B
I. Morgenstern, K.A. Müller, et al.
Physica B: Physics of Condensed Matter