Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
No abstract available.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.
A. Nagarajan, S. Mukherjee, et al.
Journal of Applied Mechanics, Transactions ASME