Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
The solution for potentials in a lap joint of arbitrary geometry and dissimilar materials obtained using conformal mapping is presented. The procedure leads to a dual integral equation which is solved for arbitrary potential distribution across the common segment. The continuity of potential and flux is then imposed to obtain the potential distribution across the interface. © 1987 Oxford University Press.
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
A.R. Gourlay, G. Kaye, et al.
Proceedings of SPIE 1989
David Cash, Dennis Hofheinz, et al.
Journal of Cryptology
Martin Charles Golumbic, Renu C. Laskar
Discrete Applied Mathematics