Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
When a closed curve immersed in the plane evolves by its curvature vector, singularities can form before the curve shrinks to a point. We show how to use the curvature flow on space curves to define a natural continuation of the planar solution for all time. © 1992, International Press of Boston, Inc. All Rights Reserved.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
John S. Lew
Mathematical Biosciences
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J Combin Optim
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Proceedings of SPIE - The International Society for Optical Engineering