E. Cartier, F.R. McFeely, et al.
VLSI Technology 2005
GaN microcolumns were grown on Si/SiO2 wafers by selective-area metallorganic molecular beam epitaxy. Scanning electron microscopy (SEM) at low and high magnifications showed the morphology of the selective area growths in a stripe and at the stripe edge, respectively. SEM also provided a near cross section and hexagonal cross section plan view of the microcolumns. Cathodoluminescence spectroscopy provided images of the microcolumns in panchromatic mode, using 365 nm luminescence, and using 570 nm luminescence.
E. Cartier, F.R. McFeely, et al.
VLSI Technology 2005
E. Cartier, V. Narayanan, et al.
VLSI Technology 2004
E. Tutuc, S. Guha, et al.
Applied Physics Letters
K.-L. Lee, M.M. Frank, et al.
VLSI Technology 2006