Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
Paper
Room Temperature Chemical Polishing of Ge and GaAs
Abstract
No abstract available.
Related
Robert W. Keyes
Physical Review B
T. Schneider, E. Stoll
Physical Review B
R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP