Effect of HCI degradation on the variability of MOSFETS
C. Zhou, Keith A. Jenkins, et al.
IRPS 2018
We demonstrate outstanding resistance-drift (R-drift) mitigation and void elimination as reliability benefits of a thin metallic liner. By tuning the resistivity of the liner, the confined PCM with a metallic liner yields an extremely low R-drift coefficient (∼0.01). We also show for the first time that confined PCM could have a self-recovering property by incorporating a metallic liner. The experimental results with real-time in-situ transmission electron microscope (TEM) exhibit the robustness of the confined PCM that can recover by itself without any extra circuits.
C. Zhou, Keith A. Jenkins, et al.
IRPS 2018
Baozhen Li, Andrew Kim, et al.
IRPS 2018
Robert L. Bruce, Gloria Fraczak, et al.
SPIE Advanced Lithography 2017
Dominik Metzler, Florian Weilnboeck, et al.
JVSTB